U.S. and international clients choose Krieg DeVault to secure and enforce their intellectual property rights. Our lawyers have technical backgrounds in chemical, mechanical, and biotechnology. We combine all these strengths to protect our clients' intellectual property rights.
Krieg DeVault’s intellectual property attorneys possess a full range of prosecution experience to protect our national and international clients’ intellectual property assets. Whether counseling a start-up or Fortune 500 company, our intellectual property attorneys, many of which are registered to practice before the U.S. Patent and Trademark Office, routinely guide clients through the extensive prosecution process while taking into consideration the specific business initiatives, concerns, and other valuable information needed to build strong patent, trademark, and copyright portfolios.
Our patent prosecution experience involves the preparation and prosecution of utility and design patent applications, including preparing and prosecuting reissue applications and re-examinations, rendering patentability, validity and non-infringement opinions, resolving ownership disputes, managing interferences, and auditing client portfolios. We routinely advise clients on complex licensing, patent clearance, and adversarial matters where future litigation might occur.
A proactive insight into our clients’ business objectives enables our attorneys to effectively navigate effective prosecution protocols within the industries of manufacturing; chemical, mechanical, and electrical engineering; automotive; telecommunications; computer software; electronics; food service; education; business; medical devices; biotechnology; and aerospace.
We provide the full range of intelectual property services, including patent applications, prosecution, and counseling; trademark applications, prosecution, and counseling, copyright applications, prosecution, and counseling, trade Secrets counseling; licensing and opinions of Infringement/Non-infringement, validity/invalidity and clearance.